Uncategories TSMC Develops Hardmask for Deep Implants

TSMC Develops Hardmask for Deep Implants

TSMC is going to present its recent developments in hardmask for deep implants in small pixel sensors at NMDC, Taiwan on Oct 6-9, 2013. The paper is titled "Nanotechnology Development for CMOS Image Sensor Applications" by C.C. Wang, T.H. Hsu, S.F. Ting, C.Y. Chen, K.C. Huang, J.C. Liu, S. G. Wuu. TSMC has developed a nice hardmask process for pixel size of order of 1um:

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