The workshop's agenda:
Technology and design I
- Overview Technology Offers
Tomasz Hemperek (Universitaet Bonn (DE)) - Design and process development of CMOS image sensors with TowerJazz
Renato Turchetta (STFC - Rutherford Appleton Lab. (GB)) - APSEL Deep n-well and Deep p-well CMOS Sensors with ST and TowerJazz Technologies
Gianluca Traversi (University of Bergamo)
- Deep n-well CMOS Sensors with 3D Integration of Global Foundries Wafers
Valerio Re (INFN) - DMAPS Design in XFAB Technology
Tetsuichi Kishishita (University of Bonn) - Development of DMAPS Sensors in ESPROS Technology
Miroslav Havranek (Acad. of Sciences of the Czech Rep. (CZ))
- ESPROS technology
Martin Popp (Espros Photonics) - LFoundry Technology
Gerhard Spitzelsperger (LFoundry) - TowerJazz Technology
Avi Strum (TowerJazz)
- Design detail and performance of Fully Depleted Backside Illuminated CMOS Sensors
Stefan Lauxtermann (Sensor Creations) - AMS High Performance CIS Modules
Ingrid JONAK-AUER (AMS) - Rad-hard design in CMOS [image] sensors
Bart Dierickx (Caeleste) - Image Sensor Design and Technology Development at Fraunhofer IMS
Sasha WEYERS (Fraunhofer IMS)
- PERCIVAL: CMOS Image Sensors for Low Energy X-Ray Detection
Iain Sedgwick (STFC) - AMS Designs: CLICPix/CCPD/Mu3e
Ivan Peric (Ruprecht-Karls-Universitaet Heidelberg (DE)) - CCPD Design: from AMS to GF technology
M. Patrick Pangaud (Centre National de la Recherche Scientifique (FR))
- Design of CMOS Pixels Sensor for the STAR Experiment
Christine Hu (IPHC/IN2P3) - STAR MAPS Developments and Experiences
Leo Greiner (Lawrence Berkeley National Laboratory) - Alice Designs: Mistral, Astral, Alpide
Marc Winter (Institut Pluridisciplinaire Hubert Curien (FR))
- CMOS pixels for electron microscopy: requirements and R&D results at TEAM
Marco Battaglia (University of California,Santa Cruz (US)) - Radiation hard MAPS developments for electron microscopy
Peter Denes (LBNL) - CMOS APS for TEM
Nicola Carlo Guerrini (STFC - RAL)
- MAPS are for amateurs, professionals do 3D
Grzegorz Deptuch (Fermi National Accelerator Lab. (US)) - Advances in Bonding technologies (chip to wafer and wafer to wafer)
Ray Yarema (FNAL)
- Experience with IBM 130 nm Process for Active CMOS Pixels
Dario Gnani (LBNL) - Fully depleted MAPS: Pegasus and Mimosa 33
Maciej KACHEL (IPHC) - SLAC Developments in CMOS Sensors
Julie Segal (SLAC)
- X-ray image sensors for SACLA and future Ultimate Storage Ring Light Sources
Nobukazu Teranishi (University of Hyogo) - Lapis SOI Technology and Designs
Yasuo Arai (High Energy Accelerator Research Organization (JP))
- Characterization of CCPDV3 HV-CMOS sensors capacitively coupled to CLICpix 65 nm CMOS readout ASICs
Mathieu Benoit (CERN LCD) - CMOS MAPS in Planar and 3D Technologies: TID Effects and Bulk Damage Study
Lodovico Ratti (University of Pavia) - Radiation Hardness of the Tower/Jazz 0.18 µm Imaging CMOS Process
Michael Deveaux (Johann-Wolfgang-Goethe Univ. (DE))
- Design and Characterization of a High-Speed Multi-frame Hybrid CMOS Sensor
John Porter (Sandia National Laboratories) - ESPROS DMAPS: Results and Radiation Hardness
Theresa Obermann (Universitaet Bonn (DE))